Thin polycrystalline zinc oxide films obtained by oxidation of metallic zinc films |
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Authors: | Ya.I. Alivov R.Y. Korotkov |
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Affiliation: | a Institute of Microelectronics Technology, RAS, Chernogolovka, Moscow dist., 142432, Russia b Department of Physics, M. V. Lomonosov Moscow State University, Moscow, Russia c Atofina Chemicals Inc., Corporate Research, 900 First Avenue, King of Prussia, PA, 19406, USA |
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Abstract: | Thin polycrystalline ZnO films were obtained by thermal oxidation of metallic Zn films, thermally deposited on various substrates, such as silica, sapphire and glass, in both air and pure oxygen atmospheres. The quality of the ZnO layers was asserted by Hall effect, cathodoluminescence and atomic force microscopy measurements. Electron concentration of 7.32×1012 cm−3 and mobility of 14.2 cm2/V s with root mean square roughness of 30 nm were obtained for the 900 °C annealed ZnO films in oxygen. Room temperature cathodoluminescence spectra consisted of a narrow near band edge luminescence band and a broad defect-related green band with peak positions at 380 and 500 nm, respectively. ZnO film luminescence properties improved dramatically with the increase of annealing temperature and decrease of O2 pressure. |
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Keywords: | Metallic zinc films Oxidation Polycrystalline zinc oxide films |
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