低温水浴制备ZnO纳米晶薄膜的研究 |
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引用本文: | 邓建平,汪敏强,宋孝辉.低温水浴制备ZnO纳米晶薄膜的研究[J].纳米科技,2013(4):30-34. |
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作者姓名: | 邓建平 汪敏强 宋孝辉 |
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作者单位: | 西安交通大学电子与信息工程学院,陕西西安710049 |
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摘 要: | 首先在低温下制备了粒径小于10nm的ZnO纳米晶,然后采用旋口法制备了ZnO纳米晶薄膜,XRD分析ZnO晶相是纤锌矿结构;SEN与AFM表明,纳米晶薄膜在300℃退火后薄膜的厚度明显地减小到130nm(未退火200nm),粒径明显增大,表面粗糙度减少到3.27nm(未退火4.89nm);紫外-可见吸收和透射比光谱表明,随着退火温度的增加,吸收边发生了红移,吸收肩更明显,薄膜具有高的透射率(75—85%),随着温度增加薄膜方阻增大,300℃以下退火方阻增加很小(小于8.5Ω/sq),400℃以上退火方阻大幅增加(大于21.1n/sq),假定存在最优退火温度点(300℃)。
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关 键 词: | ZnO纳米晶 ZnO薄膜 水热法 旋涂法 |
Research the Preparation of ZnO Nanocrystalline Film by Water Bath Method at Low Temperature |
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Authors: | DEND Jian-ping WANG Min-qiang SONG Xiao-hui |
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Affiliation: | (Electronic Materials Research Laboratory Xi'an Jiaotong University, Xi'an 710049, China) |
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Abstract: | ZnO Nanocrystallines (d〈10 nm) were prepared at low temperature,and ZnO nanocrystalline films were prepared by spin-coating. XRD analysed confirms the formation of ZnO phase with hexagonal wurtzite crystal structure; SEM and AFM showed that when the films was annealed at 300 ℃ ,the thickness of the film reduced to 130nm (nonsintered 200 nm),the particle size significantly increased and the surface roughness reduced to 3.27 nm (nonsintered 4.89 nm); UV-Visual absorption and transmission spectra showed that the absorption edge shifted to red,the absorption shoulder widen and the transparency of all films were 75-85%; the sheet resistance of the films increased with the increasing of temperature,the increasing was small (〈 8.5 Ω/sq) when the temperature 300 ℃ and it was large (〉 21.1 Ω/ sq) the temperature was above 400 ℃, So it could be assmned that there was optimal annealing temperatures (300 ℃). |
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Keywords: | ZnO nanoerystalline ZnO films hydrothermal method spin-coated method |
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