Characterization of electroplated nickel |
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Authors: | T. Fritz H. S. Cho K. J. Hemker W. Mokwa U. Schnakenberg |
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Affiliation: | (1) Institute of Materials in Electrical Engineering I Aachen University of Technology (RWTH Aachen), Sommerfeldstrasse 24, D-52074 Aachen, Germany, DE;(2) Departments of Mechanical Engineering and Materials Science, The John Hopkins University, Baltimore MD, USA, US |
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Abstract: | Properties of electroplated nickel such as crystallographic texture, Young's modulus, strength and microstructure strongly depend on the parameter mean current density used for electrodeposition. By means of micro tensile testing mechanical material parameters were determined. At low mean current density (2 mA/cm2) brittle layers with high Young's modulus and high strength were obtained, whereas at high current density (15 mA/cm2) ductile layers with low Young's modulus and low strength were deposited. Received: 10 August 2001/Accepted: 24 September 2001 Parts of the work were carried out within the project ELMINOS, which is supported by the state of North Rhine-Westphalia, Germany. The equipment used for the experiments was funded by the state of North Rhine-Westphalia. We would like to express our sincere gratitude to Mirko Hofmann for his assistance in performing the measurements of indentation hardness. The participation of Cho and Hemker was sponsored by the Defense Advanced Research Projects Agency (DARPA) and Air Force Research Laboratory, Air Force Material Command, USAF, under agreement number F30602-99-2-0553. This paper was presented at the Fourth International Workshop on High Aspect Ratio Microstructure Technology HARMST 2001 in June 2001. |
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