| 涂胶膜厚优化试验与控制方法 |
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| 引用本文： | 洪诗捷,沈奕.涂胶膜厚优化试验与控制方法[J].现代显示,2005(11):44-46. |
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| 作者姓名： | 洪诗捷 沈奕 |
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| 作者单位： | 汕头超声显示器有限公司,汕头,515041 |
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| 摘 要： | 针对本公司目前所用RC-550涂胶机,对影响涂胶膜厚的主要参数（胶轮压力、光刻胶粘度和流量以及胶轮转动速度等）进行试验,得出光刻胶涂布的最优化条件,并对如何获得稳定的涂胶膜厚提出合理化建议.
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| 关 键 词： | 液晶显示器 光刻胶 膜厚 RC-550涂胶机 胶轮压力 光刻胶粘度 |
| 文章编号： | 1006-6268（2005）11-0044-03 |
| 收稿时间： | 2005-11-11 |
| 修稿时间： | 2005年11月11 |
Study of Photo-resist Coating Technology to Achieve Optimized Film Thickness |
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| HONG Shi-jie,SHEN Yi.Study of Photo-resist Coating Technology to Achieve Optimized Film Thickness[J].Advanced Display,2005(11):44-46. |
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| Authors: | HONG Shi-jie SHEN Yi |
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| Abstract: | In this study, the coating parameters such as roller pressure and rolling speed.photo-resist viscosity and flow rate were experimented using the coating machine RC-550, The results show that the optimized film thickness can be achieved by changing the parameters as concerned. Also, some suggestions on how to keep stable and uniform coating during production were provided. |
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| Keywords: | LCD photo-resist film thickness |
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