| 用于制备YBCO薄膜的光辅助MOCVD反应器内流动现象的数值研究 |
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| 引用本文： | 李晖,左然,方秀军,李国兴,周本初.用于制备YBCO薄膜的光辅助MOCVD反应器内流动现象的数值研究[J].工程力学,2011(6):206-211. |
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| 作者姓名： | 李晖 左然 方秀军 李国兴 周本初 |
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| 作者单位： | 江苏大学能源与动力工程学院;集美大学机械工程学院;吉林大学电子科学与工程学院; |
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| 摘 要： | 对一种制备YBCO薄膜的光辅助MOCVD反应器内的流动现象进行了三维数值模拟研究.在模拟计算中,分别改变基座与进口的相对角度(Φ)、反应器顶壁倾斜角度(Ψ),得出反应器中流场的相应变化.根据对模拟结果的分析,发现当基座平面与进气口轴线之间的夹角Φ=22.5°及反应器顶壁倾角ψ=30°时,基片表面气流速度大小合适,分布均...
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| 关 键 词： | MOCVD YBCO 反应器 流场 数值模拟 |
NUMERICAL STUDY OF FLOW PHENOMENA IN A PHOTO-ASSISTED MOCVD REACTOR FOR PREPARING YBCO THIN FILMS |
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| LI Hui,ZUO Ran,FANG Xiu-jun,LI Guo-xing,ZHOU Ben-chu.NUMERICAL STUDY OF FLOW PHENOMENA IN A PHOTO-ASSISTED MOCVD REACTOR FOR PREPARING YBCO THIN FILMS[J].Engineering Mechanics,2011(6):206-211. |
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| Authors: | LI Hui ZUO Ran FANG Xiu-jun LI Guo-xing ZHOU Ben-chu |
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| Affiliation: | LI Hui1,2,ZUO Ran1,FANG Xiu-jun3,LI Guo-xing3,ZHOU Ben-chu3(1.School of Energy and Power Engineering,Jiangsu University,Zhenjiang 212013,China,2.School of Mechanical Engineering,Jimei University,Xiamen 361021,3.School of Electronic Science and Engineering,Jilin University,Changchun 130012,China) |
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| Abstract: | Three-dimensional numerical study on flow phenomena in a photo-assisted MOCVD reactor for preparing YBCO thin films is conducted.By varying the angle between susceptor surface and inlet axis(Φ) and the top wall inclination angle(Ψ),velocity fields inside the reactor are calculated.It is found that the flow field is suitable for growing YBCO thin films when Φ=22.5° and Ψ=30° due to the uniform velocity and the depressed convection roll. |
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| Keywords: | MOCVD YBCO reactor flow field numerical simulation |
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