| PLC在ECR等离子源设备中的应用 |
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| 引用本文： | 吕鑫,程健,彭辉俊. PLC在ECR等离子源设备中的应用[J]. 真空, 2004, 41(5): 29-31 |
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| 作者姓名： | 吕鑫 程健 彭辉俊 |
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| 作者单位： | 中国科学技术大学自动化系,安徽,合肥,230027 |
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| 摘 要： | 简要地介绍了ECR等离子源设备的特点和测控要求,给出了以PLC为主实现设备控制的方法.系统的硬件由触摸屏(或上位机)、PLC控制器和信号调理电路部分构成;软件由二次开发的触摸屏运行的组态监控软件、PLC运行软件以及可选的基于PC机的上位机软件组成.整个控制系统可实现现场手动操作、触摸屏(或上位机)手动操作及全自动控制运行,能进行等离子体参数如电子温度、离子密度、空间电位等的测量.
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| 关 键 词： | ECR等离子源 设备控制 |
| 文章编号： | 1002-0322(2004)05-0029-03 |
Application of PLC in ECR plasma facility |
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| LV Xin,CHENG Jian,PENG Hui-jun. Application of PLC in ECR plasma facility[J]. Vacuum(China), 2004, 41(5): 29-31 |
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| Authors: | LV Xin CHENG Jian PENG Hui-jun |
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| Abstract: | Introduces the characteristics of ECR plasma facility and puts forward the way how to control the facility with PLC. The hardware of the facility is composed of a touch panel or supervisor PC, PLC and signal modulation circuit, with its softwares incluling touch panel and PLC running programs we developed further. The facility can work wholly manually, only by touch panel in manual mode or full automatic mode to measure the plasma parameters, such as electronic temperature, ion density and space potential. |
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| Keywords: | PLC |
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