| 厚度对DLC薄膜内应力的影响研究 |
| |
| 引用本文： | 谷坤明,吕乐阳,毛斐,虞烈,汤皎宁.厚度对DLC薄膜内应力的影响研究[J].功能材料,2011,42(Z1):102-105. |
| |
| 作者姓名： | 谷坤明 吕乐阳 毛斐 虞烈 汤皎宁 |
| |
| 作者单位： | 谷坤明,吕乐阳,毛斐,汤皎宁,GU Kun-ming,LV Le-yang,MAO Fei,TANG Jiao-ning(深圳大学,材料学院,深圳市特种功能材料重点实验室,广东,深圳,518060);虞烈,YU Lie(西安交通大学机械学院,陕西,西安,710049) |
| |
| 基金项目： | 国家高技术研究发展计划(863计划)资助项目，广东省科技计划资助项目，深圳市科技计划资助项目 |
| |
| 摘 要： | 采用ECR微波等离子体增强化学气相沉积的方法于C1H2/H2/Ar2等离子环境中在单晶Si(111)晶面上制备了不同厚度的DLC膜样品,研究了薄膜的厚度随沉积时间的变化及薄膜的硬度、内应力随厚度的变化关系.结果表明,在沉积时间变化范围内,厚度与沉积时间基本呈线性关系,沉积速率可达80nm/min;制备态样品存在的内应力...
|
| 关 键 词： | ECR-CVD DLC膜 内应力 |
Thickness dependence of internal stress in DLC films |
| |
| GU Kun-ming,LV Le-yang,MAO Fei,YU Lie,TANG Jiao-ning.Thickness dependence of internal stress in DLC films[J].Journal of Functional Materials,2011,42(Z1):102-105. |
| |
| Authors: | GU Kun-ming LV Le-yang MAO Fei YU Lie TANG Jiao-ning |
| |
| Affiliation: | GU Kun-ming1,LV Le-yang1,MAO Fei1,YU Lie2,TANG Jiao-ning1(1.Materials School of Shenzhen University,Shenzhen Key Laboratory of Special Functional Materials,Shenzhen 518060,China,2.Mechanical College of Xi'an Jiaotong University,Xi'an 710049,China) |
| |
| Abstract: | In this paper,serials of DLC films on single crystalline Si(111) substrates with different thickness were prepared by ECR microwave plasma enhanced chemical vapor deposition method in C2H2/H2/Ar2 plasma environment.The variation of thickness with deposition time and the thickness dependence of hardness,internal stress of films were investigated.It was showed that within selected time range,the thickness changes linear with deposition time and the deposition rate could be up to 80nm/min.The internal stress i... |
| |
| Keywords: | ECR-CVD |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
