Department of Mechanical and Aerospace Engineering, University of Delaware, Newark, Delaware 19711, USA
Abstract:
The effects of ion implantation and subsequent annealing on the microstructure of molybdenum have been investigated by transmission electron microscopy. The ions investigated were carbon, nitrogen, and tellurium. The ion-induced damage was found to give rise to grain boundary migration phenomena both during implantation and during subsequent annealing. Precipitation or ordering was found to occur for each ion on annealing.