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Photo-sensitive characteristics of negative resistance turn-around occurring in SIPTH
Ji Tao, Yang Licheng, Li Hairong, He Shanhu, Li Siyuan. Photo-sensitive characteristics of negative resistance turn-around occurring in SIPTH[J]. Journal of Semiconductors, 2009, 30(4): 044006. doi: 10.1088/1674-4926/30/4/044006 Ji T, Yang L C, Li H R, He S H, Li S Y. Photo-sensitive characteristics of negative resistance turn-around occurring in SIPTH[J]. J. Semicond., 2009, 30(4): 044006. doi: 10.1088/1674-4926/30/4/044006.Export: BibTex EndNote
Authors:Ji Tao  Yang Licheng  Li Hairong  He Shanhu  Li Siyuan
Affiliation:School of Fundamental Studies, Shanghai University of Engineering Science, Shanghai 201620, China;Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China;Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China;Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China;Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Abstract:Influences of light irradiation on the negative resistance turn-around characteristics of static induction photosensitive thyristor(SIPTH)have been experimentally and theoretically studied.As the gate current of SIPTH is increased by the light irradiation,the potential barrier in the channel is reduced due to the increase in voltage drop across the gate series resistance.Therefore.SIPTH Can be quickly switched from the blocking state to the conducting state by relatively low anode voltage.The optimal matching relation for controlling anode conducting voltage of SIPTH by light irradiation has also been represented.
Keywords:static induction photosensitive thyristors  gate series resistance  double injection effect  potential bar tier  light-generated carriers
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