Improvement in the electrical properties of ferroelectric SrBi2Ta2O9 capacitors by electron beam irradiation on precursor films |
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Authors: | Soichiro Okamura Tomokazu Kobayashi Tadashi Shiosaki |
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Affiliation: | Graduate School of Materials Science , Nara Institute of Science and Technology (NAIST) , 8916–5 Takayama-cho, Ikoma, Nara, 630-0101, Japan |
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Abstract: | Abstract Ferroelectric SrBi2Ta2O9 (SBT) capacitors were fabricated by the Electron-Beam-Induced Patterning process and their electrical properties were evaluated in detail. In this process, the dose of an electron beam irradiated on precursor films had a great influence on the electrical properties of the SBT capacitors. The appropriate electron dose significantly improved the electrical properties of the SBT capacitors although the excess electron dose made severe deterioration in the properties. The SBT capacitors fabricated with the optimum electron dose, 1.5 mC/cm2 for Sr:Bi:Ta = 0.8:2.2:2.0 solutions, exhibited excellent ferroelectric properties: a remanent polarization of 11.5 μC/cm2, a coercive field of 40 kV/cm, a leakage current of 8×10?8 A/cm2@ 1V and fatigue-free up to 1010 cycles. It seems that such improvements were caused by the adjustment of Bi contents in the films and the modification or the decompositon of precursors before heat treatment by electron beam irradiation. |
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Keywords: | ferroelectric SBT thin film electron beam ferroelectric dose capacitor SBT |
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