The Modeling and Calculation of One Transistor Memory Devices

Metal/Ferroelectrics/Metal/Insulator/Si (MFMIS) and Metal/Ferroelectrics/ Insulator/Si (MFIS) one-transistor devices are being proposed for non-volatile memory applications. In order to determine the basic theory of one-transistor memory devices, we use equivalent circuits to model and calculate the basic properties of one-transistor memory devices. The capacitance of MFMIS and MFIS capacitors, memory windows, operation voltages, threshold voltages, and both switching and retention properties of one-transistor memory devices have also been calculated. According to the modeling and calculation, the ferroelectric materials with lower dielectric constant (?), low polarization (P_R), appropriate coercive field and square hysteresis loop are required for one-transistor memory devices and low voltage applications. High dielectric constant insulator materials may improve the performance of one-transistor memory devices. In addition, the effects of depolarization fields, leakage current, and defect density on the switching and retention properties of one-transistor memory devices are also calculated. Based on the modeling and calculation, the retention problem dealing with depolarization fields and leakage current is a big challenge for one-transistor memory devices.