| 磁控溅射Ti合金薄膜结构特征及贮氢性能 |
| |
| 引用本文： | 马爱华,郑华,刘实,王隆保. 磁控溅射Ti合金薄膜结构特征及贮氢性能[J]. 材料研究学报, 2005, 19(1): 64-71 |
| |
| 作者姓名： | 马爱华 郑华 刘实 王隆保 |
| |
| 作者单位： | 中国科学院金属研究所 |
| |
| 摘 要： | 采用磁控溅射方法制备了Ti膜及TiMo、TiMoYAl和TiZrYAl等三种合金膜.合金膜中Mo、Zr和Al三种元素成份与靶材成分基本一致,而Y元素则与靶材成分有较大的偏差.在400℃吸氢工艺下,四种膜材的吸氢动力学性能良好,没有脱膜现象,饱和吸氢量均可超过1.5(H/M).膜材的吸氢PCT曲线表明,含Mo合金膜材具有最高的吸氢平衡压,外推出的室温下的数量级约为10-4Pa.
|
| 关 键 词： | 金属材料 磁控溅射 Ti合金薄膜 贮氢 磁控溅射 合金薄膜 结构特征 贮氢性能 films alloy magnetron sputtering storage characteristic hydrogen 室温 外推 吸氢平衡压 曲线 饱和吸氢量 现象 脱膜 吸氢动力学性能 膜材 工艺 偏差 |
| 文章编号： | 1005-3093(2005)01-0064-08 |
| 收稿时间： | 2004-04-15 |
| 修稿时间： | 2004-04-15 |
The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films |
| |
| MA Aihua,ZHENG Hua,LIU Shi,WANG Longbao. The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films[J]. Chinese Journal of Materials Research, 2005, 19(1): 64-71 |
| |
| Authors: | MA Aihua ZHENG Hua LIU Shi WANG Longbao |
| |
| Abstract: | The magnetron sputtering method was used to prepare Ti-base alloy films. The concentration of the alloy elements such as Mo, Zr and Al in the films is consistent with that in the targets, while the Y concentration has a large deviation from that in the targets. The hydrogen absorption dynamics of the four films at 673 K is fine and the TiZrYAI film has the best hydriding activity. The hydrogen storage capacities of all the four films exceed 1.5 (H/M). The hydrogen absorption P-C isotherms of the films were measured. The films alloying with Mo have the highest hydrogen absorption equilibrium pressure, which is determined as about 10-4 Pa at ambient temperature. |
| |
| Keywords: | metallic materials magnetron sputtering Ti alloy film hydrogen storage |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
| 点击此处可从《材料研究学报》浏览原始摘要信息 |
|
点击此处可从《材料研究学报》下载全文 |
