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Fast silicon p doped low temperature bolometer
Authors:C. Boragno   U. Valbusa   G. Gallinaro   D. Bassi   S. lannotta  F. Mori
Affiliation:1. GNSM and Dipartimento di Fisica, Università di Genova, Genova Italy;2. INFN and Dipartimento di Fisica, Università di Genova, Genova Italy;3. Istituto di Scienze Fisiche, Università di Trento, Povo Italy
Abstract:The construction of a fast silicon p doped low temperature bolometer is described. It is a 5 × 5 × 0.3 mm Si <100 > n-type chip whose surface has been implanted with p doses of the order of 1018cm−3. The bolometer has a response time better than 1 μs, a responsivity of 104VW−1 and a NEP of .
Keywords:superconductivity   bolometer   semiconductor
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