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微立体光刻技术研究及应用
引用本文:于成龙,王秀峰,江红涛,单联娟.微立体光刻技术研究及应用[J].激光与光电子学进展,2006,43(3):15-20.
作者姓名:于成龙  王秀峰  江红涛  单联娟
作者单位:陕西科技大学材料科学与工程学院,咸阳,712081
摘    要:综述了国内外最近几年微立体光刻技术的研究进展。阐述了微立体光刻技术中的线扫描技术及面投影技术的基本原理及分类,分析了它们的技术核心并对相关参数进行了比较。简要阐述了微立体光刻技术在制造原型、微系统部件及微流体装置等方面的应用,最后,对该技术的发展前景作了展望。

关 键 词:微立体光刻  微制造  快速原型制造  微电子机械系统
收稿时间:2005-09-08
修稿时间:2005-09-082005-10-20

Development and Application of Microstereolithography
YU Chenglong,WANG Xiufeng,JIANG Hongtao,SHAN Lianjuan.Development and Application of Microstereolithography[J].Laser & Optoelectronics Progress,2006,43(3):15-20.
Authors:YU Chenglong  WANG Xiufeng  JIANG Hongtao  SHAN Lianjuan
Abstract:Development of microstereolithography both domestic and abroad is summarized. Basic principle and classification of the vector-by-vector microstereolithography and the integral microstereolithography are given. Key techniques and characteristics of the two technologies are analyzed. Application of microstereolithography in the fabrication of prototypes, microsystem components and microfluidic components is also briefly analyzed. Finally, prospect of the microstereolithography is offerred.
Keywords:microstereolithography  microfabrication  rapid prototyping  micro electro mechanical systems
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