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Properties of Bi-doped PbTe epitaxial layers and pn junction diodes grown by TDM-CVP
Authors:Arata Yasuda  Ken Suto  Jun-ichi Nishizawa
Affiliation:a Department of Materials Science, Tohoku University, Aoba-Yama 02, Sendai 980-0845, Japan;b Semiconductor Research Institute, Kawauchi Aoba, Sendai 980-0862, Japan
Abstract:Effects of Bi-doping in PbTe liquid-phase epitaxial layers grown by the TDM-CVP have been investigated. For Bi concentration in the solution, xBi, lower than 0.2 at.%, Hall mobility is low. In contrast, for xBi>0.2 at.%, Hall mobility is high, while carrier concentration is in the range 1017 cm−3. However, ICP emission analysis shows that, for xBi=1.0 at.%, Bi concentration in epitaxial layer is NBi=2.3–2.7×1019 cm−3.These results indicate that Bi behaves not only as a donor but also as an acceptor; the nearest neighbor or very near DA pairs are formed. Carrier concentration for Bi-doped layers takes a minimum value at a Te vapor pressure of 2.2×10−5 Torr for growth temperature 470°C, which is coincident with that of the undoped PbTe. And broad contact pn junctions with highly Bi-doped layers easily cause laser emission compared to undoped junctions. The result suggests that the nearest lattice site Bi–Bi DA pairs behave as strong radiative centers in PbTe.
Keywords:Author Keywords: PbTe  LPE  Bi-doped  Laser emission
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