|
|||||
|
|
Directed Self‐Assembly of Poly(2‐vinylpyridine)‐b‐polystyrene‐b‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template |
|
| Authors: | Zhiwei Sun Zhenbin Chen Wenxu Zhang Jaewon Choi Caili Huang Gajin Jeong E Bryan Coughlin Yautzong Hsu XiaoMin Yang Kim Y Lee David S Kuo Shuaigang Xiao Thomas P Russell |
| Affiliation: | 1. Department of Polymer Science and Engineering, University of Massachusetts Amherst, Amherst, MA, USA;2. College of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou, Gansu, China;3. Seagate Technology, LLD, Fremont, CA, USA |
| Abstract: | |
| Keywords: | directed self‐assembly lamellar block copolymers nanoimprint photoresist templates salt complexes solvent vapor annealing |