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CMOS and SiGe bipolar circuits for applications up to 110 GHz
Authors:A. L. Scholtz Ao. Univ.-Prof. Dipl.-Ing. Dr. techn.  D. Kehrer Dipl.-Ing. Dr. techn.  M. Tiebout Marc   Dipl.-Ing. Dr. techn.  H. -D. Wohlmuth Hans-Dieter   Dipl.-Ing. Dr. techn.  H. Knapp Dipl.-Ing. Dr. techn.  M. Wurzer Dipl.-Ing.  W. Perndl Dipl.-Ing.  M. Rest  C. Kienmayer Dipl.-Ing.  R. Thüringer Dipl.-Ing.  W. Bakalski Dipl.-Ing.  W. Simbürger Dipl.-Ing. Dr. techn.
Affiliation:1. Institute for Communications and Radio Frequency Engineering, Vienna University of Technology, Gu?hausstra?e 25/389, A-1040, Wien
2. Vienna University of Technology and Infineon Technologie AG, Austria
3. Infineon Technologies AG, Corporate Research, Otto-Hahn-Ring 6, D-81739, München
Abstract:Recently, CMOS has been demonstrated to be a viable technology for very-high-bit-rate broad-band and wireless communication systems up to 40 Gb/s and 50 GHz. Advances in device scaling and doping-profile optimization have also resulted in SiGe bipolar transistors with impressive performance, including cut-off frequencies of more than 200 GHz. This paper presents advances in circuit design which fully exploit the high-speed potential of a 0.13 µm CMOS technology up to 50 GHz and of a high-performance SiGe bipolar technology up to 110 GHz operating frequency. The combination of advanced circuit techniques and a state-of-the-art fabrication-process technology results in continuing the upward shift of the frequency limits.
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