| Fe膜及磁场沉积对TbDy-Fe膜磁伸性能的影响 |
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| 引用本文： | 毛宏英,周白杨,雷德辉,汤乐明,邓光华.Fe膜及磁场沉积对TbDy-Fe膜磁伸性能的影响[J].微细加工技术,2008(3). |
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| 作者姓名： | 毛宏英 周白杨 雷德辉 汤乐明 邓光华 |
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| 作者单位： | 福州大学,材料科学与工程学院,福州,350002 |
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| 基金项目： | 福建省科技厅高新技术科研项目，福州大学校科研和校改项目，福建省科技厅资助高校项目 |
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| 摘 要： | 为了提高TbDv-Fe膜的低场磁敏性,采用离子束溅射沉积(IBSD)法制备TbDy-Fe超磁致伸缩薄膜,分别研究了纯Fe膜与TbDy-Fe单层膜、TbDy-Fe/Fe耦合多层膜的复合及磁场下溅射沉积对TbDy-Fe膜磁致伸缩性能的影响;用振动样品磁强计(VSM)测试薄膜磁滞回线,用电容位移测量仪测试薄膜悬臂梁自由端偏转量,并计算出磁致伸缩系数λ.结果表明,由IBSD法制备的纯Fe膜、TbDy-Fe单层膜、TbDy-Fe/Fe复合膜的易磁化轴均平行于膜面,TbDy-Fe/Fe复合膜在低场下的磁化强度与磁导率均高于TbDy-Fe单层膜(在100 kA/m时,TbDy-Fe/Fe复合膜的磁化强度比TbDy-Fe单层膜高173%).纯Fe膜分别与TbDy-Fe单层膜、TbDy-Fe/Fe耦合多层膜进行复合均可提高薄膜磁致伸缩性能;磁场下溅射沉积所得180 nm纯Fe膜 640 nmTbDy-Fe/Fe耦合多层膜,由于在其膜面内短轴方向产生感生磁各向异性,从而使磁致伸缩性能得到进一步的提高,在150 kA/m的磁场下它的λ值可达到650×10-6.
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| 关 键 词： | 离子束溅射沉积 TbDy-Fe膜 复合 耦合 磁致伸缩 |
The Effects of Fe Film and Field-sputtering on TbDy-Fe Films Magnetostriction |
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| MAO Hong-ying,ZHOU Bai-yang,LEI De-hui,TANG Le-ming,DENG Guang-hua.The Effects of Fe Film and Field-sputtering on TbDy-Fe Films Magnetostriction[J].Microfabrication Technology,2008(3). |
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| Authors: | MAO Hong-ying ZHOU Bai-yang LEI De-hui TANG Le-ming DENG Guang-hua |
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| Affiliation: | MAO Hong-ying,ZHOU Bai-yang,LEI De-hui,TANG Le-ming,DENG Guang-hua(College of Materials Science , Engineering,Fuzhou University,Fuzhou 350108,China) |
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| Abstract: | To promote the magnetostrictive sensibility of TbDy-Fe films at low magnetic field,TbDy-Fe giant mgnetostrictive films was fabricated by ion beam sputtering deposition(IBSD).The effects of composite of Fe film with TbDy-Fe single-layer film as well as withTbDy-Fe/Fe coupling multilayer and field-sputtering on their magnetostriction were investigated respectively.Magnetic hysteresis loops were measured by using a vibrating sample magnetometer.Deflection of the film cantilever free end was measured by capacit... |
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| Keywords: | IBSD TbDy-Fe film composite coupling magnetostriction |
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