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厚膜导体的金属迁移研究
引用本文:李自学 田耀亭. 厚膜导体的金属迁移研究[J]. 微电子学与计算机, 1996, 13(2): 13-15,19
作者姓名:李自学 田耀亭
作者单位:西安徽电子技术研究所
摘    要:金属迁移能导致混合微电路发生灾难性失效。本文介绍一种简单易行的测试方法-水滴试验法,来测量厚膜电路的实际金属迁移率。用引方法测量时,发现Pd-Ag导体的迁移率最大,Pt-Au导体的金属迁移率最小。

关 键 词:金属迁移 厚膜导体 混合集成电路 测试

Metal Migration in Thick Film Conductor
Li Zixue Tial,Yaotins and Tian Shuying$. Metal Migration in Thick Film Conductor[J]. Microelectronics & Computer, 1996, 13(2): 13-15,19
Authors:Li Zixue Tial  Yaotins  Tian Shuying$
Abstract:Metal Migration has been the cause of many catastrophic microcircuit failures. in this paper we discribed an effective and simple test-water drop test.It's a good practice to test thick film conductor for metal migrations.Tie results was given here: Pd-Ag conductors had the highest propensity of migration,Pt-Au conductors had the lowest one. Also, metal migration in Pd-Ag conductors has been studied with electrochemical theory. Finally some ground rules to suppress of prevrnt migration have been suggested.
Keywords:Thick film   Metal migration   Pd- Ag conductor
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