Study of the formation processes of gold droplet arrays on Si substrates by high temperature anneals |
| |
Authors: | Alla Klimovskaya Andrey Sarikov Yury Pedchenko Andrey Voroshchenko Oksana Lytvyn Alexandr Stadnik |
| |
Affiliation: | (1) 1 V. Lashkarev Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 41 Nauki Avenue, 03028 Kiev, Ukraine |
| |
Abstract: | In this study, the peculiarities of the transformations of gold films deposited on the Si wafer surfaces as a result of high
temperature anneals are investigated experimentally depending on the conditions of wafer surface preparation and the annealing
regimes. The morphology and the distribution functions of the crystallites of gold films as well as the gold droplets formed
as a result of anneals are studied as functions of annealing temperature, type of annealing (rapid thermal or rapid furnace
annealing), and the state of the surface of Si wafers. The results obtained can be used for the controlled preparation of
the arrays of catalytic gold droplets for subsequent growth of Si wire-like crystals. |
| |
Keywords: | |
本文献已被 PubMed SpringerLink 等数据库收录! |
|