| MAGNETORESISTANCE EFFECT OBSERVED IN Fe／Mo MULTILAYERS PREPARED BY ELECTRON BEAM EVAPORATION |
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| 引用本文： | T.He,B.Zhao,Y.Gao,F.Zeng,F.Pan. MAGNETORESISTANCE EFFECT OBSERVED IN Fe／Mo MULTILAYERS PREPARED BY ELECTRON BEAM EVAPORATION[J]. 金属学报(英文版), 2003, 16(3): 237-240 |
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| 作者姓名： | T.He B.Zhao Y.Gao F.Zeng F.Pan |
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| 作者单位： | Laboratory of Advanced Materials，Department of Materials Science and Engineering，Tsinghua University，Beijing 100084，China，Laboratory of Advanced Materials，Department of Materials Science and Engineering，Tsinghua University，Beijing 100084，China，Laboratory of Advanced Materials，Department of Materials Science and Engineering，Tsinghua University，Beijing 100084，China，Laboratory of Advanced Materials，Department of Materials Science and Engineering，Tsinghua University，Beijing 100084，China，Laboratory of Advanced Materials，Department of Materials Science and Engineering，Tsinghua University，Beijing 100084，China |
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| 摘 要： | The Fe/Mo multilayers were prepared by electron beam evaporation, the micro structure and magnetic properties of the multilayers were studied by X-ray diffraction, vibrating-sample magnetometer (VSM) et al. The experimental results revealed that the Fe/Mo multilayers in our experimental conditions behaved magnetoresistance effect with a sharp peak on magnetoresistance (MR) ratio curve, and magnetoresistance is easily saturated at low applied magnetic fields. For [Fe(1.5nm)/Mo(1.0nm)]4,2 multilayers, MR ratio could arrive to 0.1%. The antiferromagnetic interlayer coupling could be observed in some films at room temperature. The strength of the antiferromagnetic interlayer coupling J in the films is low because of the low saturation field Hs. The relationship between magnetic properties and micro structure was also discussed in this paper.
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| 收稿时间： | 2002-11-25 |
MAGNETORESISTANCE EFFECT OBSERVED IN Fe/Mo MULTILAYERS PREPARED BY ELECTRON BEAM EVAPORATION |
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| T.He,B.Zhao,Y.Gao,F.Zeng,F.Pan. MAGNETORESISTANCE EFFECT OBSERVED IN Fe/Mo MULTILAYERS PREPARED BY ELECTRON BEAM EVAPORATION[J]. Acta Metallurgica Sinica(English Letters), 2003, 16(3): 237-240 |
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| Authors: | T.He B.Zhao Y.Gao F.Zeng F.Pan |
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| Affiliation: | Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University,Beijing,100084, China |
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| Abstract: | The Fe/Mo multilayers were prepared by electron beam evaporation, the micro structure and magnetic properties of the multilayers were studied by X-ray diffraction, vibrating-sample magnetometer (VSM) et al. The experimental results revealed that the Fe/Mo multilayers in our experimental conditions behaved magnetoresistance effect with a sharp peak on magnetoresistance (MR) ratio curve, and magnetoresistance is easily saturated at low applied magnetic fields. For [Fe(1.5nm)/Mo(1.0nm)]4,2 multilayers, MR ratio could arrive to 0.1%. The antiferromagnetic interlayer coupling could be observed in some films at room temperature. The strength of the antiferromagnetic interlayer coupling J in the films is low because of the low saturation field Hs. The relationship between magnetic properties and micro structure was also discussed in this paper. |
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| Keywords: | magnetoresistance multilayer antiferromagnetic interlayer coupling nonmagnetic scattering |
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