A new method to determine the work-function difference and itsapplication to calibrate the boron-segregation coefficient |
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| Authors: | Pole-Shang Lin Chia-Haur Chang |
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| Affiliation: | Electron. Res. & Service Organ., Hsin-chu; |
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| Abstract: | The authors present a technique to determine the work-function difference from a plot of the threshold voltage (VT) versus oxide thickness (Tox) curve. The extraction errors caused by the electrical characteristics of the oxide and the SiO 2/Si interface can be minimized by the VT-Tox technique. The boron segregation coefficient can be calibrated from the slope of the VT -Tox curve. Comparisons between the experimental data and simulation results are made, and good agreement is obtained |
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