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能量过滤磁控溅射技术制备ITO薄膜及其特性研究
引用本文:姚宁,常立红,韩昌报,邢宏伟,葛亚爽,崔娜娜,王英俭,张兵临. 能量过滤磁控溅射技术制备ITO薄膜及其特性研究[J]. 真空科学与技术学报, 2011, 31(3): 278-282. DOI: 10.3969/j.issn.1672-7126.2011.03.06
作者姓名:姚宁  常立红  韩昌报  邢宏伟  葛亚爽  崔娜娜  王英俭  张兵临
作者单位:1. 中国科学院安徽光学精密机械研究所,合肥,230031;郑州大学物理工程学院,郑州,450052
2. 郑州大学物理工程学院,郑州,450052
3. 中国科学院安徽光学精密机械研究所,合肥,230031
基金项目:国家自然科学基金资助项目
摘    要:采用磁控溅射(DMS)和能量过滤磁控溅射(EFDMS)技术在玻璃衬底上制备ITO透明导电薄膜。利用扫描电子显微镜、原子力显微镜、X射线衍射、紫外-可见分光光度计、四探针电阻仪、椭偏光谱仪等对薄膜的性能进行表征和分析,初步探讨了EFDMS技术的成膜机理。研究发现与DMS技术相比,EFDMS技术可有效降低薄膜的表面粗糙度,并且薄膜光电性能有一定改善。

关 键 词:ITO薄膜  光电性能  表面粗糙度  磁控溅射  能量过滤磁控溅射

Growth and Characterization of Indium-Tin-Oxide Films by Energy Filtered DC Magnetron Sputtering
Yao Ning,Chang Lihong,Han Changbao,Xing Hongwei,Ge Yashuang,Cui Nana,Wang Yingjian,Zhang Binglin. Growth and Characterization of Indium-Tin-Oxide Films by Energy Filtered DC Magnetron Sputtering[J]. JOurnal of Vacuum Science and Technology, 2011, 31(3): 278-282. DOI: 10.3969/j.issn.1672-7126.2011.03.06
Authors:Yao Ning  Chang Lihong  Han Changbao  Xing Hongwei  Ge Yashuang  Cui Nana  Wang Yingjian  Zhang Binglin
Affiliation:Yao Ning1,2,Chang Lihong2,Han Changbao2,Xing Hongwei2,Ge Yashuang2,Cui Nana2,Wang Yingjian1,Zhang Binglin2 (1.Anhui Institute of Optics and Find Mechanics,Chinese Academy of Sciences,Hefei 230031,China,2.Department of Physics,Zhengzhou University,Zhengzhou 450052,China)
Abstract:The indium-tin-oxide(ITO) films were grown by DC magnetron sputtering and by energy filtered DC magnetron sputtering on glass substrates,respectively.The impacts of the growth conditions on the quality of the ITO films were studied.Its microstructures and properties were characterized with X-ray diffraction,scanning electron microscopy,atomic force microscopy,ultra violet visible light spectroscopy,ellipsometry,and conventional probes.The results show that the energy filtered DC sputtering considerably impr...
Keywords:ITO film  Photoelectric properties  Surface roughness  DC magnetron sputtering  Energy filtered DC magnetron sputtering  
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