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Liquid film behavior in annular two-phase flow under flow oscillation conditions
Authors:Tomio Okawa  Taisuke Goto  Yosuke Yamagoe
Affiliation:1. nHance Engineering Solutions, Hyderabad, India;2. George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA;1. Graduated School of Engineering, Kobe University, Japan;2. University of Notre Dame, Notre Dame, USA;1. University of Naples Federico II, Department of Industrial Engineering, P.le Tecchio 80, 80125 Naples, Italy;2. Université de Lyon, INSA-Lyon, CETHIL UMR5008, F-69621 Villeurbanne, France
Abstract:Experiments were carried out to investigate the effects of sinusoidal forced oscillation of the inlet flow rate on the time variations of local liquid film thickness and the frequencies of large wave’s passing in steam–water annular two-phase flows. The liquid film thickness oscillated with the same period as the inlet flow rate. The mean film thickness in the thin film regions decreased and approached to an asymptotic value with an increase in the oscillation period of the inlet flow rate. This result was consistent with the experimental results of the occurrence of liquid film dryout under flow oscillation conditions reported in the literature. It was hence considered that the axial liquid transport from the thick to thin film regions mitigates the reduction of the critical heat flux caused by the flow oscillation. It was also found that the wave frequency in the thin film region increased with a decrease in the oscillation period. This observation suggested that the disturbance waves contribute to the enhancements of the liquid transport and consequently the critical heat flux associated with the liquid film dryout under flow oscillation conditions.
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