| 5-硝基二氢苊在无显影气相光刻中的光致诱蚀作用的研究——5-硝基二氢苊的光氧化反应 |
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| 引用本文： | 洪啸吟,刘丹,李钟哲,刘密新.5-硝基二氢苊在无显影气相光刻中的光致诱蚀作用的研究——5-硝基二氢苊的光氧化反应[J].感光科学与光化学,1992(4). |
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| 作者姓名： | 洪啸吟 刘丹 李钟哲 刘密新 |
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| 作者单位： | 清华大学化学系，清华大学化学系，清华大学化学系，清华大学化学系 北京 100084，北京 100084，北京 100084，北京 100084 |
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| 摘 要： | 5-硝基二氢苊的光氧化作用在无显影气相光刻中起着重要作用。我们通过红外,核磁共振、色质联用等手段对其光氧化产物进行了分析,并合成了有关化合物进行对照,确认5-硝基二氢苊的主要光氧化产物是5-硝基苊、5-硝基二氢苊酮、羟基-5-硝基二氢苊。
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| 关 键 词： | 无显影气相光刻、5-硝基二氢苊 光氧化作用 羟基-5-硝基二氢苊 |
STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY --THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN |
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| HONG XIAO-YIN LIU DAN LI ZHONG-ZHE LIU MI-XIN.STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY --THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN[J].Photographic Science and Photochemistry,1992(4). |
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| Authors: | HONG XIAO-YIN LIU DAN LI ZHONG-ZHE LIU MI-XIN |
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| Abstract: | The photooxidation of 5-nitroacenaphthene plays an important role in the development-free vapor photolithography. The major oxidation products have been analysed by means of FT-1R, H-NMR, HPLC-MS. The results were compared with that of anthenic samples synthesized in our laboratory. It was shown that the majorphotooxidation products of 5-nitroacenaphthene are 5-nitroaoenaphthenol, 5-nitroacenaphthenone and 5-nitroacenaphthylene. |
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| Keywords: | development-free photolithography 5-nitroacenaphthene photooxidation 5-nitroacenaphthenol |
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