| RF反应磁控溅射纳米晶ZnO薄膜的XRD和XPS研究 |
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| 引用本文： | 刘黎明,杨培志.RF反应磁控溅射纳米晶ZnO薄膜的XRD和XPS研究[J].微纳电子技术,2007,44(9):897-899. |
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| 作者姓名： | 刘黎明 杨培志 |
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| 作者单位： | 昆明物理研究所,昆明,650223 |
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| 摘 要： | 采用RF反应磁控溅射沉积ZnO薄膜,沉积完成后对薄膜进行氧气氛下的原位退火处理。薄膜的结晶状况和化学成分分别采用XRD和XPS进行分析。结果表明,该薄膜为结晶性能良好的纳米晶薄膜,具有高度的C轴取向性。薄膜的主要成分为ZnO,不存在金属态Zn。采用文中的工艺方法可获得较高质量的纳米晶ZnO薄膜。
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| 关 键 词： | 纳米晶ZnO薄膜 RF反应磁控溅射 原位退火 X射线衍射 X射线光电能谱 |
| 文章编号： | 1671-4776（2007）09-0897-03 |
| 修稿时间： | 2007-02-01 |
Study on XRD and XPS of ZnO Nanocrystalline Thin Films Prepared by RF Reactive Magnetron Sputtering Technology |
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| LIU Li-ming,YANG Pei-zhi.Study on XRD and XPS of ZnO Nanocrystalline Thin Films Prepared by RF Reactive Magnetron Sputtering Technology[J].Micronanoelectronic Technology,2007,44(9):897-899. |
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| Authors: | LIU Li-ming YANG Pei-zhi |
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| Affiliation: | Kunming Institute of Physics, Kunming 650223, China |
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| Abstract: | ZnO thin films were deposited by RF reactive magnetron sputtering technology,then the films were annealed in oxygen ambient in situ.The crystallinity and chemical compositions were investigated using XRD and XPS.The results show that the films are nanocrystalline with highly C-axis oriented crystalline particles.The main compound of the films is ZnO,and there is no Zn in metal state.It proves that high quality nanocrystalline ZnO thin films can be obtained by the technology. |
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| Keywords: | nanocrystalline ZnO thin films RF reactive magnetron sputtering in situ annealing XRD XPS |
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