Nb3Si films with zero resistance Tc at 11.9 K fabricated by sputtering Nb on Si substrates |
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| Authors: | Li Jui Chen Juh Tzeng Lue |
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| Affiliation: | Department of Physics, National Tsing Hua University, Hsinchu, Taiwan, ROC |
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| Abstract: | Dendritic textured Nb3Si thin films, deposited by sputtering pure niobium onto silicon substrates, exhibit a rather high zero-resistance critical temperature, Tc. X-ray and TEM measurements reveal the films to be polycrystalline with the A15 phase. The resistance begins to drop sharply at a temperature of 13.3 K and down to zero at 11.9 K without residual resistivity. |
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| Keywords: | Nb3Si A15 structures Sputtering Films Nb onto Si Tc = 11.9 K |
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