| 国外硅基UMBIRFPA制备技术研究进展 |
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| 引用本文： | 程开富.国外硅基UMBIRFPA制备技术研究进展[J].半导体光电,1998,19(1):1-4. |
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| 作者姓名： | 程开富 |
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| 作者单位： | 重庆光电技术研究所 |
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| 摘 要： | 介绍了国外硅基非致冷微测辐射热计红外焦平面阵列（Ｓｉ＋ＵＭＢＩＲＦＰＡ）的典型结构，制备工艺技术以及ＵＭＢＩＲＦＰＡ的性能参数。
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| 关 键 词： | 红外探测器 红外焦平面阵列 热像仪 |
Research development on fabrication technology of silicon-based UMBIRFPA abroad |
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| CHENG Kaifu.Research development on fabrication technology of silicon-based UMBIRFPA abroad[J].Semiconductor Optoelectronics,1998,19(1):1-4. |
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| Authors: | CHENG Kaifu |
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| Abstract: | This paper describes typical structure and fabrication technology of uncooled micro-bolometer infrared focal plane arrays (UMBIRFPA) being researched abroad.The performance para meters of UMBIRFPA are also given. |
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| Keywords: | Uncooled Thermal Detectors Micro-bolometer Infrared Focal Plane Array Thermal Imager |
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