Thermodynamic modeling of BCxNy chemical vapor deposition from mixtures of N-trimethylborazine and nitrogen |
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| Authors: | A. N. Golubenko M. L. Kosinova V. S. Sulyaeva Yu. M. Rumyantsev N. I. Fainer F. A. Kuznetsov |
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| Affiliation: | 1.Novosibirsk State University,Novosibirsk,Russia;2.Nikolaev Institute of Inorganic Chemistry, Siberian Division,Russian Academy of Sciences,Novosibirsk,Russia |
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| Abstract: | Thermodynamic modeling of the chemical vapor deposition of boron-carbonitride-based films in the B-C-N-H-O system using mixtures of N-trimethylborazine and nitrogen is carried out for reduced pressures (13.3 and 1.33 Pa) and a wide temperature range (300–1300 K). The source of oxygen impurities in this system is a residual pressure of 0.40 Pa. The results indicate that films of various compositions can be grown. The conditions for the deposition of BC x N y films are identified. |
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