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n-Type CVD diamond: Epitaxy and doping
Authors:M.-A. Pinault-Thaury  T. TillocherN. Habka  D. KoborF. Jomard  J. ChevallierJ. Barjon
Affiliation:a Groupe d’Etude de la Matière Condensée (GEMaC), CNRS, Université Versailles St Quentin (UVSQ), 1, place Aristide Briand, 92195 Meudon Cedex, France
b Laboratoire de Chimie et de Physique des Matériaux (LCPM), Université de Ziguinchor, Quartier Diabir, BP 523, Ziguinchor, Senegal
Abstract:Diamond is a semiconductor with superlative properties in terms of operating temperature, breakdown voltage and thermal dissipation for high power electronic applications. The p-type doping is currently controlled but it is not the case for the n-type doping. In spite of the low solubility of substitutional donors bigger than carbon, n-type material can be achieved via impurity doping during the growth of diamond with phosphorus dopant (Ec = 0.6 eV). Theoretical studies also predict arsenic as a shallower dopant (Ec = 0.4 eV). This paper outlines the n-type doping issues with phosphorus and explores the arsenic doping.
Keywords:n-Type diamond   CVD   Phosphorus   Arsenic   Incorporation model
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