| 面投影微立体光刻技术研究进展 |
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| 引用本文： | 于成龙,王秀峰,江红涛,单联娟.面投影微立体光刻技术研究进展[J].新技术新工艺,2006(5):22-25. |
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| 作者姓名： | 于成龙 王秀峰 江红涛 单联娟 |
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| 作者单位： | 陕西科技大学材料科学与工程学院,712081 |
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| 摘 要： | 综述了国内外最近几年面投影微立体光刻技术的研究进展.阐述了液晶动态掩膜技术和数字微反射镜动态掩膜技术的基本原理.分析了两者的技术核心并对相关参数进行了比较.最后,对该技术的发展前景作了展望.
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| 关 键 词： | 面投影微立体光刻 微制造 快速原型制造 |
Research Progress of Integral Microstereolithography |
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| Yu ChengLong;Wang XiuFeng;Jiang GongTao;Chan LianJuan.Research Progress of Integral Microstereolithography[J].New Technology & New Process,2006(5):22-25. |
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| Authors: | Yu ChengLong;Wang XiuFeng;Jiang GongTao;Chan LianJuan |
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| Abstract: | Development of integral microstereolithography both domestic and abroad is summarized in this paper. Basic principles of integral microstereolithography technology using a liquid crystal display dynamic mask-generator and using a digital micromirror device as dynamic mask-generator are given. The key techniques and features of the two technologies are analyzed and compared. Finally, the prospect of the integral microstereolithography is foreseen. |
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| Keywords: | MEMS |
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