|
|||||
|
|
A comparative study of atomic layer deposition of Al2O3 and HfO2 on AlGaN/GaN |
|
| Authors: | Xiaoye Qin Lanxia Cheng Stephen McDonnell Angelica Azcatl Hui Zhu Jiyoung Kim Robert M. Wallace |
| Affiliation: | 1. Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, TX, 75080, USA |
| Abstract: | |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ | |