MEMS压印模板制作的刻蚀机理及尺寸控制方法

为了提高基于湿法刻蚀压印模板制作工艺中刻蚀图形尺寸的控制精度，研究了玻璃湿法刻蚀的反应动力学过程，得到刻蚀剂中（HF）2为决定反应速率的主要活性成分的结论；结合实验建立了合理的刻蚀速率模型．采用不同氢氟酸浓度的刻蚀液进行了实验，实测刻蚀速率与理论计算数值的对比结果表明模型预测精度达到96％以上．基于该模型刻蚀深度确定刻蚀时间进行了压印模板制作的实验，制作了图形特征尺寸为15μm、刻蚀深度为8μm的压印模板．对模板图形的测量结果表明，通过该模型预测的尺寸误差仅为0．05μm．

Etching Mechanism and Pattern Size Controlling Method in Imprint Template Fabrication for MEMS

To improve the accuracy of etched pattern size controlling in imprint template fabrication process based on glass wet etching,the reaction kinetic mechanism of the soda-lime glass dissolution process in aqueous HF-based solution was studied and the dominant active component(HF)2 in etching agent was identified. Based on the combination of mechanism analysis and etching experiments,a reasonable theoretical model of etching rate was established. Experiments in etchants with various concentrations of hydrofluo...