Growth of highly textured aluminum films on LiTaO3 with optimized titanium intermediate layers |
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Authors: | R Nüssl C SenftD Beckmeier T JewulaW Ruile T SulimaW Hansch I Eisele |
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Affiliation: | a Institute of Physics, University of the Federal Armed Forces, Werner-Heisenberg-Weg 39, 85579 Neubiberg, Germanyb EPCOS AG, SAW Division, Munich, Germany |
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Abstract: | Ultra thin titanium films in the range of a few nanometers have been deposited on monocrystalline lithiumtantalate (LiTaO3) followed by deposition of 400 nm pure aluminum (Al). Texture measurements by means of electron backscatter diffraction show that the thickness of the intermediate titanium (Ti) layer significantly influences texture and grain structure of the overlying Al film. Increasing the thickness of the Ti layer from 0 nm to 20 nm leads to a change of aluminums texture from unoriented polycrystalline over highly oriented in single direction to highly oriented in twin structure. |
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Keywords: | Epitaxy Aluminum Titanium Lithium tantalate Scanning Electron Microscopy Atomic Force Microscopy Electron backscatter diffraction Electron beam evaporation |
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