关于全膜并联电容器真空浸渍工艺探讨

在全膜并联电容器的制造过程中，真空浸渍工艺过程是极其关键的。全膜并联电容器真空浸渍工艺过程是否完善，既与电容器单元内部结构，尤其是元件结构及其在真空浸渍工艺过程所处的姿态密切相关，又与真空浸渍工艺过程中的3个关键参数，即：温度、真空度、时间，密不可分。本文对这两方面进行了初步探讨，希望对提升全膜并联电容器的产品质量有所帮助．

Discussion on Vacuum Impregnation Process for All-film Shunt Capacitors

The vacuum impregnation process is extremely critical in the production process of all-film shunt capacitors. Perfection of vacuum impregnation process of all-film shunt capacitors production is closely related not only to internal structure of all-film shunt capacitor unit, especially to the ele- ments structure and its configuration in the process of vacuum impregnation, but also to such three key parameters in the process as temperature, vacuum and time. In this paper, a preliminary dis- cussion on those two aspects is made, which is expected to help to improve quality of all-film shunt capacitors.