Thin-film processing of high-Tc superconductors |
| |
| Authors: | C. H. Stoessel R. F. Bunshah S. Prakash H. R. Fetterman |
| |
| Affiliation: | (1) Department of Materials Science and Engineering, University of California-Los Angeles, 90024-1595 Los Angeles, California;(2) Department of Electrical Engineering, University of California-Los Angeles, 90024-1595 Los Angeles, California |
| |
| Abstract: | This review of high-Tc superconducting thin-film processing focuses on the developments in thin-film deposition technologies since 1987. The common deposition processes are described with reference to their effects on superconductor film performance. A comparative evaluation of the potential of the technologies is also given. The development of multilayers and heterostructures is an important requirement for future device applications and is also described. The latest results of the deposition of novel superconducting materials and deposition on uncommon substrates are discussed. The outlook on some imminent topics of future development in process technologies for high-Tc superconducting thin films is discussed. |
| |
| Keywords: | Superconductors thin films thin-film processing thin-film deposition sputtering coevaporation activated reactive evaporation molecular beam epitaxy laser ablation CVD MO-CVD PA-CVD multilayers heterostructures |
| 本文献已被 SpringerLink 等数据库收录！ |
