微波等离子体CVD法在非平面基体上生长金刚石膜

介绍了在微波等离子体CVD装置中,用甲烷和氢气作为原料,在非平面基体(如钨丝、钻头、铣刀等)上生长金刚石薄膜的研究。在金刚石沉积过程中,由于"尖端效应",在基体的尖端很难沉积出金刚石膜。在采用金属丝屏蔽后,克服了"尖端效应",成功地在非平面基体上沉积出了金刚石膜。用扫描电镜(SEM)和激光拉曼光谱(Raman)分析了金刚石膜的形貌和质量。结果表明:非平面基体不同位置金刚石的晶形不同,晶粒比较细小,膜的质量较高。

Diamond Film Growth on Non-planar Substrate by MPCVD

Diamond thin films are grown on non-planar substrates, such as tungsten wires, drills, milling cutters, by using methanol and hydrogen mixture in microwave plasma chemical vapor deposition (MPCVD) reactor. During the diamond deposition, it is difficult to grow diamond films on the tips of the substrates because of the glow discharge concentration. Therefore, a metal wire shielding method was used to avoid the glow discharge concentration. The surface morphology and quality of diamond coatings were examined by Scanning Electron Microscopy (SEM) and Raman Spectroscopy (Raman). The results showed that the high quality, small grain size diamond films were deposited on non-planar substrate and the crystal shape is different on different locations of the substrate.