实验参数对金刚石薄膜内应力的影响研究

采用热丝化学气相沉积法(HFCVD)在硬质合金基体上制备金刚石薄膜涂层,采用SEM观察金刚石薄膜形貌,采用Raman光谱法分析制备的金刚石薄膜与基体的内应力。变化丝基间距、偏流、碳浓度等参数,通过测定拉曼光谱单一谱峰的位移Δω计算涂层的内应力,从而得到制备内应力较小的金刚石膜的工艺参数范围。

Effect of Experimental Parameters on Internal Stress in Diamond Films

The diamond films were deposited on cemented carbide substrate by hot filament chemical vapor deposition(HFCVD),the morphology of diamond films was observed by SEM,the internal stress between diamond films and substrate was studied by Raman spectrometry.The internal stress was calculated through the shifts Δω of single spectrum peak of Raman spectrum with variations of parameters such as distance between filaments,bias flow,carbon concentration,the range of parameters for smaller internal stress on adhesion of diamond films was got.