| 铝靶电流对TiAlN薄膜组织结构与性能的影响 |
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| 引用本文： | 廖凤娟,赵广彬,谭刚,罗磊,张丽珍,何迪,李欣健.铝靶电流对TiAlN薄膜组织结构与性能的影响[J].西华大学学报(自然科学版),2014(6):66-68. |
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| 作者姓名： | 廖凤娟 赵广彬 谭刚 罗磊 张丽珍 何迪 李欣健 |
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| 作者单位： | 西华大学材料科学与工程学院 |
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| 基金项目： | “高档数控机床与基础制造装备”科技部重大专项(2009ZX04012-23);四川省特种材料及制备技术重点实验室项目 |
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| 摘 要： | 采用非平衡磁控溅射离子镀技术在YG6硬质合金表面沉积Ti Al N薄膜,研究Al靶的溅射电流对TixAl1-xN薄膜组织结构与性能的影响。利用X线衍射仪、扫描电子显微镜和显微硬度仪等分析仪器对制备的TixAl1-xN薄膜的相结构、表面形貌和显微硬度进行测试分析。测试结果表明:膜层中存在Ti3Al N、Al N相,且Ti3Al N沿(220)晶面择优取向。SEM测试表明,随Al靶功率的提高,膜层晶粒结构变得更致密。显微硬度仪测得薄膜平均硬度最高可达2 980 HV。
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| 关 键 词： | Ti Al N膜 非平衡磁控溅射 Al靶电流 |
The Effect of AI Target Current on the Microstructure and Properties of TiAIN Film |
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| LIAO Feng-juan;ZHAO Guang-bin;TIAN Gang;LUO Lei;ZHANG Li-zhen;HE Di;LI Xin-jian.The Effect of AI Target Current on the Microstructure and Properties of TiAIN Film[J].Journal of Xihua University:Natural Science Edition,2014(6):66-68. |
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| Authors: | LIAO Feng-juan;ZHAO Guang-bin;TIAN Gang;LUO Lei;ZHANG Li-zhen;HE Di;LI Xin-jian |
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| Affiliation: | LIAO Feng-juan;ZHAO Guang-bin;TIAN Gang;LUO Lei;ZHANG Li-zhen;HE Di;LI Xin-jian;School of Materials Science and Engineering,Xi Hua University; |
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| Abstract: | TiA1N films were deposited by unbalanced magnetron sputtering method on cemented carbide YG6 substrates. Effect of AI target current on the phase, surface topography and micro - hardness was investigated with XRD, SEM, micro - hardness instruments and so on. The XRD patterns of the films confirmed the formation of Ti3 A1N phase and A1N phase, and the coatings showed a fairly strong （220） preferred orientation. The SEM imagines revealed that the grain structure of the films became denser with the increase in Al target current. The average micro - hardness value reached 2 980HV. |
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| Keywords: | TiA1N film unbalanced magnetron sputtering Al target current |
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