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熔盐电沉积过程温度对1.6Si无取向硅钢Si扩散的影响
引用本文:李慧,梁精龙,赵晓萍,李运刚,张芬萍. 熔盐电沉积过程温度对1.6Si无取向硅钢Si扩散的影响[J]. 特殊钢, 2014, 35(6): 12-14
作者姓名:李慧  梁精龙  赵晓萍  李运刚  张芬萍
作者单位:1河北联合大学冶金与能源学院现代冶金技术教育部重点实验室,唐山063009;2河北工业职业技术学院,石家庄050000
摘    要:试验了通过NaCl-KCl-NaF-SiO2熔盐在电流密度50 mA/cm2、电沉积脉冲电流正反向比9:1和750~850℃60min电沉积下阴极(/mm)20×20×0.5的1.6Si无取向冷轧硅钢片断面层硅的分布,并通过计算得出Si的扩散系数。结果表明,电沉积温度由750℃提高至850℃时,试样中Si含量增加,扩散的深度由18μm提高到40μm;电沉积温度与Si在钢中的扩散系数近似符合Arrhenius指数关系。

关 键 词:无取向硅钢  电沉积  温度    扩散系数  
收稿时间:2014-06-10

Effect of Temperature on Diffusion of Si in 1.6Si Non-Oriented Silicon Steel during Molten Salt Electro-Deposit Process
Li Hui,Liang Jinglong,Zhao Xiaoping,Li Yungang,Zhang Fenping. Effect of Temperature on Diffusion of Si in 1.6Si Non-Oriented Silicon Steel during Molten Salt Electro-Deposit Process[J]. Special Steel, 2014, 35(6): 12-14
Authors:Li Hui  Liang Jinglong  Zhao Xiaoping  Li Yungang  Zhang Fenping
Affiliation:1 Key Laboratory of Ministry of Education for Modem Metallurgy Technology, College o£ Metallurgy and Energy, HebeiUnited University, Tangahan 063009 ; 2 Hebei Professional Industry and Technology, Shijiazhuang 050000
Abstract:The distribution of silicon at cross section of cathode (/mm) 20 X 20 X 0. 5 sheet of 1. 6Si non-oriented cold rolled silicon steel after electro-deposit treatment by NaCl-KCl-NaF-SiO2 molten salt with current intensity 50 mA/ cm2 , electro-deposit pulse current positive-negative ratio 9:1 at 750 ~ 850 ℃ for 60min has been tested and the diffusion coefficient of Si is obtained by calculation. Results show that with increasing electro-deposit temperature from 750 ℃ to 850 ℃, the Si content in sample increases and the diffusion depth increases from 18 μm to 40 μm ; the relation between electrodeposit temperature and diffusion coefficient of Si in steel is similar to Arrhenius exponential relationship.
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