Deposition of carbon films by electrolysis of a water-ethylene glycol solution

An attempt was made to deposit carbon films by electrolysis of a water-ethylene glycol solution. Carbon plate and an n-type silicon substrate were dipped in the solution and a high d.c. potential was negatively applied on the silicon substrate. Some deposits were observed in the region between the boiling point curve and the line approximately 50 °C below and parallel to the boiling point, when electrolysis was carried out at 1 kV for 6 h. For higher potentials of 1.4–2.0 kV and longer electrolysis of 12 h, some samples showed a broad X-ray diffraction peak and Raman peaks, corresponding to graphitic carbon.