Investigation of foreign particles in polycrystalline silicon using infrared microscopy |
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| Authors: | R. Zhang E. E. van Dyk G. A. Rozgonyi J. Rand R. Jonczyk |
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| Affiliation: | a Department of Materials Science and Engineering, North Carolina State University, Campus Box 7916, Raleigh, NC 27695-7916, USA;b AstroPower Inc., Newark, DE 19702, USA |
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| Abstract: | The presence of SiC and SiNO particles in as-grown polycrystalline silicon has been investigated using infrared (IR) microscopy. These foreign particles were also characterized using electron beam induced current measurements, and scanning electron microscopy together with energy dispersive spectrum analyses. These performance-degrading inclusions were found to be distributed throughout the bulk of the material and varied in size from several microns to about 20 μm. In addition to the observation of the foreign particles, the feasibility of using IR microscopy as a characterization tool was also demonstrated. |
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| Keywords: | Polycrystalline Si Infrared microscopy SiC particles SiNO particles |
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