Hot-carrier-induced alterations of MOSFET capacitances: aquantitative monitor for electrical degradation |
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Authors: | Esseni D Pieracci A Quadrelli M Ricco B |
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Affiliation: | Dept. of Electron., Bologna Univ.; |
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Abstract: | In this paper, combined gate-to-channel (CGSD) and gate-to-bulk (CGB) capacitance measurements are used in order to extract quantitative information about hot-carrier degradation in MOS transistors. An analytical model, explaining the results of accelerated degradation experiments, is presented to establish a simple relationship between CGSD and CGB changes and the stress-induced charges Qox and Qit trapped in the oxide or in interface states, respectively. A method, validated by means of two-dimensional (2-D) numerical simulations, is proposed to determine Qox and Qit directly from the measured capacitances, and is applied to experimental data. The new technique considerably improves the capabilities of previous capacitive methods because it can yield a quantitative determination of Qox and Qit |
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