| 采用真空电弧源镀制纳米TiO2薄膜研究 |
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| 引用本文： | 周友苏,张立珊.采用真空电弧源镀制纳米TiO2薄膜研究[J].真空,2005,42(1):15-17. |
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| 作者姓名： | 周友苏 张立珊 |
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| 作者单位： | 周友苏（北京联合大学机电学院,北京,100020）;张立珊（北京联合大学机电学院,北京,100020） |
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| 摘 要： | 在真空条件下利用真空电弧源在不同基底材料上镀制了TiO2薄膜.对影响镀膜过程和膜层质量的氧气工作压强和偏压等因素进行了研究.X射线衍射结构分析结果显示TiO2薄膜主要以锐钛矿相为主及少量的金红石相.对TiO2薄膜的物理性质、化学性质进行了初步检测.
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| 关 键 词： | 真空 阴极电弧放电 TiO2薄膜 |
| 文章编号： | 1002-0322(2005)01-0015-03 |
| 修稿时间： | 2004年6月18日 |
Vacuum deposition of nanometer TiO2 thin films by way of cathode arc discharge |
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| ZHOU You-su,ZHANG Li-shan.Vacuum deposition of nanometer TiO2 thin films by way of cathode arc discharge[J].Vacuum,2005,42(1):15-17. |
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| Authors: | ZHOU You-su ZHANG Li-shan |
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| Abstract: | TiO_2 thin films were deposited on different substrates in vacuum by way of cathode arc discharge. Investigates the influences of working pressure of oxygen and voltage bias on the deposition process and thin film quality. XRD patterns of the TiO_2 thin films deposited indicated that they are mainly composed of anastate phase with little of rutile. The physical/chemical properties of the TiO_2 thin films prepared in this way were tested preliminarily. |
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| Keywords: | vacuum cathode arc discharge TiO_2 thin film |
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