| MICROSTRUCTURE AND INDENTATION BEHAVIOUR OF MULTILAYER Ti-N FILM |
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| 作者姓名： | WAGENDRISTEL A BANGERTH PANGRATZH SKALICKYP |
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| 作者单位： | Viena Technical Univessity Austria，Viena Technical University，Austria，Viena Technical University，Austria，Viena Technical University，Austria |
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| 摘 要： | The microstructure of Ti/TiN multilayer film was studied.It was shown by trans-mission electron microscopy of cross-sectional sample and respective secondary neutralsmass-spectroscopy depth profiling that the film has a periodic alternate multilayeredstructure:substrate /FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN...Ti/Ti_2N/TiN,whereFeTi and Ti_2N were the transition layers formed during ion plating.Cross-sectionalfracture surface of indentation samples had been obtained and studied with scanningelectron microscopy.It was shown that the multilayer film deformed during indentation,formed an indentation pit and a pile-up of materials around the indentation pit.As theapplied load increased deformation region extended beyond the film/substratc interfaceand into the substrate,the interlayer crack in the film and hole formation at the film/substrate interface were initiated.It is also shown that the multilayered Ti/TiN filmoffered better toughness in comparison with single layer TiN film.
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| 收稿时间： | 1993-07-11 |
| 修稿时间： | 1993-07-11 |
MICROSTRUCTURE AND INDENTATION BEHAVIOUR OF MULTILAYER Ti-N FILM |
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| WAGENDRISTEL A,BANGERTH,PANGRATZH,SKALICKYP.MICROSTRUCTURE AND INDENTATION BEHAVIOUR OF MULTILAYER Ti-N FILM[J].Acta Metallurgica Sinica(English Letters),1993,6(7):29-34. |
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| Authors: | WAGENDRISTEL A Viena Technical Univessity AustriaHUANG Rongfang Institute of Metal Research Academia Sinica Shenyang ChinaBANGERT H YANG Xia WU Lihang WANG Haifeng PANGRATZ H SKALICKY P Viena Technical University Austria Associate Professor |
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| Affiliation: | WAGENDRISTEL A Viena Technical Univessity,AustriaHUANG Rongfang Institute of Metal Research,Academia Sinica,Shenyang,ChinaBANGERT H YANG Xia WU Lihang WANG Haifeng PANGRATZ H SKALICKY P Viena Technical University,Austria Associate Professor,Institute of Metall Research,Academia Sinica,Shenyang,China |
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| Abstract: | The microstructure of Ti/TiN multilayer film was studied.It was shown by trans- mission electron microscopy of cross-sectional sample and respective secondary neutrals mass-spectroscopy depth profiling that the film has a periodic alternate multilayered structure:substrate /FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN...Ti/Ti_2N/TiN,where FeTi and Ti_2N were the transition layers formed during ion plating.Cross-sectional fracture surface of indentation samples had been obtained and studied with scanning electron microscopy.It was shown that the multilayer film deformed during indentation, formed an indentation pit and a pile-up of materials around the indentation pit.As the applied load increased deformation region extended beyond the film/substratc interface and into the substrate,the interlayer crack in the film and hole formation at the film /substrate interface were initiated.It is also shown that the multilayered Ti/TiN film offered better toughness in comparison with single layer TiN film. |
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| Keywords: | multilayer Ti-N film microstructure indentation |
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