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Electrochemical impedance characteristics of LC4 aluminum alloy treated with ZH1 technique
作者姓名:ZHANGWei  LIJiuging  WUYinshun  HEJianping
作者单位:CorrosionandProtectionCenter,UniversityofScienceandTechnologyBeijing,Beijing100083,China
基金项目:the National Natural Science Foundation Committee (No. 59 771 067).]
摘    要:ZH1 technique was used to form a corrosion resistant layer on LC4 alloy. The composition of the layer was studied by X-ray photoelectron spectroscopy (XPS). It is found that the layer is composed of oxides of metals on the substrate, such as A12O3, ZnO, MgO2, CuO, and MnO2. The electrochemical impedance spectrums (EIS) of LC4 aluminum alloy specimen were measured in NaCl solutions to study the mechanism of the corrosion resistance of the alloy treated with ZHI technique. The results show that in NaCl solutions the capacitance of the Helmholtz layer and space charge layer of the oxide coating formed on the surface of LC4 alloy is less than that of a normal metal electrode while its ohmic resistance is relatively greater. At the same time, the thickness of the Helmholtz layer is 1-3 exponentially greater than that of a normal metal electrode. Compared with a normal metal electrode, all these characteristics make it more difficult for charges to transfer between the solution and the surface of the electrode. That is why the polarized current density of LC4 alloy treated with ZHI technique kept small in 3.5% NaCl solution within a wide range of potential, and why the polarized curves of LC4 alloy treated with ZH1 technique changed a little in 3.5% NaCl solution of different pH values.Moreover, according to the capacitance of the space charge layer (Csc) obtained at different potentials in 3.5% NaCI solution, I/Csc^2-E curve was laid out. It is found that there does not exist a simple linear relation between I/Csc^2 and the potential. Therefore, the oxide coating formed on LC4 alloy with ZH1 technique is not a semiconductor at room temperature.

关 键 词:铝合金  腐蚀  电化学阻抗  LC4合金  稀土  XPS  ZH1技术  EIS

Electrochemical impedance characteristics of LC4 aluminum alloytreated with ZH1 technique
ZHANGWei LIJiuging WUYinshun HEJianping.Electrochemical impedance characteristics of LC4 aluminum alloy treated with ZH1 technique[J].Rare Metals,2002,21(1):48-55.
Authors:ZHANG Wei  LI Jiuqing  WU Yinshun  He jianping
Abstract:ZHI technique was used to form a corrosion resistant layer on LC4 alloy. The composition of the layer was studied by X-ray photoelectron spectroscopy (XPS). It is found that the layer is composed of oxides of metals on the substrate, such as Al2O3, ZnO, MgO2, CuO, and MnO2. The electrochemical impedance spectrums (EIS) of LC4 aluminum alloy specimen were measured in NaCl solutions to study the mechanism of the corrosion resistance of the alloy treated with ZH 1 technique. The results show that in NaCl solutions the capacitance of the Helmholtz layer and space charge layer of the oxide coating formed on the surface of LC4 alloy is less than that of a normal metal electrode while its ohmic resistance is relatively greater. At the same time, the thickness of the Helmholtz layer is 1-3 exponentially greater than that of a normal metal electrode. Compared with a normal metal electrode, all these characteristics make it more difficult for charges to transfer between the solution and the surface of the electrode. That is why the polarized current density of LC4 alloy treated with ZHI technique kept small in 3.5% NaCl solution within a wide range of potential, and why the polarized curves of LC4 alloy treated with ZH1 technique changed a little in 3.5% NaCl solution of different pH values. Moreover, according to the capacitance of the space charge layer (Csc) obtained at different potentials in 3.5% NaCl solution, 1/C2sc-E curve was laid out. It is found that there does not exist a simple linear relation between 1/C2sc and the potential. Therefore, the oxide coating formed on LC4 alloy with ZH1 technique is not a semiconductor at room temperature.
Keywords:aluminium alloy  rare earth metal  electrochemical impedance  corrosion
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