| 碱溶性感光树脂的结构与性能的研究 |
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| 引用本文： | 宋广杰,吴慧,金养智.碱溶性感光树脂的结构与性能的研究[J].辐射研究与辐射工艺学报,1999,17(4):219-224. |
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| 作者姓名： | 宋广杰 吴慧 金养智 |
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| 作者单位： | 北京化工大学材料科学与工程学院,北京,100029 |
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| 摘 要： | 合成了３种类型、４种配比、５种不同结构的碱溶性感光树脂，研究了碱溶性和光固化速度。随着树脂与马来酸酐配比增大，树脂的碱溶性变好，光固化速度变快，当配比大于１：０．７时，树脂具有良好的碱显影性能。用酚醛环氧丙烯酸型碱溶性树脂制备光成像抗蚀油墨，具有较佳的碱显影性能。
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| 关 键 词： | 环氧丙烯酸树脂 碱溶性 光成像 抗蚀剂 UV固化材料 |
STUDY ON THE STRUCTURE AND PROPERTY FOR ALKALI DEVELOPABLE PHOTOSENSITIVE RESINS |
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| SONG Guangjie,WU Hui,JIN Yangzhi.STUDY ON THE STRUCTURE AND PROPERTY FOR ALKALI DEVELOPABLE PHOTOSENSITIVE RESINS[J].Journal of Radiation Research and Radiation Processing,1999,17(4):219-224. |
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| Authors: | SONG Guangjie WU Hui JIN Yangzhi |
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| Abstract: | Five different forms,four ratioes and three kinds of alkali developable photosensitive resins were systhesized. Especially this paper studied their alkali developable as well as the light curing speed. Along with adding the ratio between photosensitive resin and maleic anhydride,alkali developable was better and the light curing speed was faster. When the ratio was more than 1:0.7, the resin had better alkali developable. Photoimage etching ink made up by alkali developable novolak epoxy acrylic resin had better alkali developable. |
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| Keywords: | Epoxy acrylic resin Alkali developable Photoimage Etching UV curing material |
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