Fakultät für Elektrotechnik, Universität der Bundeswehr, München D-8014, Neubiberg, Germany
Abstract:
Methods for measuring the intrinsic capacitances of small geometry MOS transistors are described. The influence of short- and narrow-channel effects on the capacitance characteristics of MOS transistors is evaluated. The results are compared with long-channel devices. It is shown that the presented capacitance methods can be used to study the physics of short-channel transistors.