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Concentration profiles of passive films formed on niobium metal and niobium-base alloys by auger electron spectrometry
Authors:M Romand  JS Solomon  WL Baun
Affiliation:Laboratoire de Chimie Appliquée et Génie Chimique (C.N.R.S., E.R.A. n° 300) Université Claude Bernard, Lyon, France;University of Dayton Research Institute Dayton, Ohio 45469 U.S.A.;Air Force Materials Laboratory, Wright-Patterson AFB, Ohio 45433, U.S.A.
Abstract:Concentration profiles of passive films formed on electrolytically anodized niobium and niobium-base alloys are obtained by Auger Electron Spectroscopy with simultaneous ion beam etching. The alloys investigated include 5Zr-Nb, 3Zr-10Ti-Nb, 2.5Zr-2W-Nb and 1Zr-5Mo-5V-Nb. Experiments demonstrate that AES is among the most fascinating techniques for solving various characterization problems related to the structure and composition of the thin films formed by anodization. Data presented supports evidence that combined anodic and cathodic movements take place during film growth.
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