Depth profiles of deuterium in titanium from gas emission during sputtering |
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Authors: | RG Musket |
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Affiliation: | Sandia Laboratories, Livermore, CA 94550, USA |
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Abstract: | A simple technique for the determination of the depth distributions of deuterium and tritium in the near-surface region (0–1 μm) of materials has been demonstrated. In particular, the depth distribution of deuterium in a layered, deuterided titanium film has been determined by monitoring the HD and D2 gas emissions during sputtering by 2 keV argon ions. For the nonoptimized conditions employed the detection sensitivity was and the fractional depth resolution was ~0.24 (i.e., ~240Å for a 1000Å film). Even for these conditions, this technique has a near-surface depth resolution superior, or equal, to that of other techniques for profiling hydrogen and a more than adequate sensitivity for the detection of deuterium and tritium in CTR-related studies, hydride studies and studies of tritided targets for neutron production. |
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